Chrome-on-glass photomasks, metal shadow masks, and full CAD design conversion, GDS, DXF, DWG, PDF, or hand drawings accepted. 3-day quote, no minimum order.
At Nanosystems JP Inc., we handle the full workflow. Submit any format of design data, and our engineers convert, verify, and fabricate to your exact specifications.
Send us your customer drawing, sketch, or any existing CAD file. Our engineers convert it to production-ready GDS-II, DXF, or DWG format with full DRC verification. We also provide original mask layout design from your process specification.
Submit a drawing →Accepted input formats:
Precision photomask fabrication on soda-lime, borosilicate, or fused silica glass substrates. Chrome pattern by direct-write e-beam or laser writing. Suitable for all photolithography aligners and steppers from contact to projection.
Three complementary fabrication methods, matched to your feature size, material, and application. Solder paste stencils (PCB/electronics), OLED evaporation masks, semiconductor deposition masks, and MEMS shadow masks, all from the same coordinated project.
Photoresist patterned on both sides of metal sheet, simultaneously etched through. Cost-effective for prototypes to medium volumes. Taper on sidewalls (~10% of thickness). Best for apertures ≥1× sheet thickness.
Fiber laser trepanning cuts sharp-edged apertures with no photomask required. Vertical sidewalls with minimal taper (<10% of t). Next-day possible for small jobs. Best choice for solder paste stencils and standard deposition masks.
Nickel built up by electroforming (plating deposition) around a photoresist master. Achieves the smoothest possible aperture walls, best paste and material release. Minimum 30µm aperture opening. For fine-pitch BGA, micro-LED, and advanced OLED.
Submit any format. Our engineers handle the rest, conversion, verification, writing, and quality inspection, before shipment to your lab worldwide.
Upload GDS, DXF, DWG or customer drawing via secure portal or email
Engineers convert & verify format, run DRC, confirm CD targets
E-beam or laser direct-write on glass; wet etching for metal masks
CD-SEM, defect scan, transmission measurement & data sheet issued
Packed in mask shipping box, tracked delivery, typically 7–14 days total
Our photomasks use a chromium layer deposited on optical-grade glass. The chrome is patterned by direct-write e-beam or laser writing for sub-micron feature fidelity. Supplied with pellicle frame option.
Compatible with all mask aligner formats (MA6, EVG, Karl Süss), KrF/i-line steppers, and contact/proximity exposures.
The optimal metal mask route depends on your feature size, required aperture wall quality, material, and volume. All three methods are available , you get a recommendation with your quote at no extra charge.
Your photolithography customers also need physical deposition masks, for patterning materials that cannot tolerate resist chemistry, high-temperature PVD, or large-area substrates where spinning resist is impractical.
Send us any format, GDS, DXF, DWG, customer drawing, or even a hand sketch. Our engineers review personally and respond with a technical quote within 3 business days.