Application-Specific Fabrication

Biochip, Microfluidic and
Organ-on-Chip Fabrication

At Nanosystems JP Inc., we offer full-service biochip and microfluidic chip fabrication on glass, silicon, and polymer substrates. 500 × 600 mm large-format glass processing for low cost-per-chip on biosensor arrays. NIL, replicated from e-beam-written masters, for sub-50 nm nanopores and LSPR structures; feature size confirmed per program. PDMS soft lithography for organ-on-chip. DRIE for Bio-MEMS. All bonding methods.

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Glass 500 × 600 mm Borosilicate · Quartz Silicon DRIE 50:1 PDMS soft lithography PC · COP · PMMA NIL nanopores <50 nm LSPR Au nanostructures Au · Pt · ITO electrodes
3
Substrate families:
glass, silicon, polymer
500 × 600 mm
Max glass panel lowest chip cost
<50 nm
NIL nanopores &
LSPR structures
6
Bonding methods
for chip sealing
Three Substrate Families

Glass, silicon, and polymer each with distinct advantages

The substrate defines fabrication route, optical properties, chemical resistance, thermal stability, cost, and biocompatibility. We fabricate on all three, and build hybrid chips combining two.

Glass

Up to 500 × 600 mm · Borosilicate · Quartz · Fused Silica
Optically transparent Chemically inert Hermetic bonding

Glass is the workhorse substrate for high-performance microfluidic chips: optically transparent for fluorescence imaging and absorbance measurement, resistant to most acids, bases, and solvents that dissolve PDMS (HF-based chemistries excepted), and compatible with high-temperature sterilization. Our 500 × 600 mm large-format glass processing enables more chips per run than any wafer-format foundry, dramatically reducing cost-per-chip for array biosensors and diagnostic plates.

Standard glass materials: borosilicate (Eagle XG, Pyrex), quartz (UV-transparent for 200 nm excitation), fused silica (lowest autofluorescence), and soda lime (lowest cost for disposable chips). Channels and features defined by HF wet etching (isotropic, rounded profile), laser ablation, or ICP-RIE (anisotropic, vertical walls). Thin film electrode deposition of Au, Pt, ITO, TiN available on the same substrate before bonding.

500 × 600 mm panel Borosilicate · Quartz · Fused silica HF wet etch, isotropic channels ICP-RIE, vertical walls Au · Pt · ITO electrodes Anodic / fusion bonding

Silicon

4 to 12 inch · DRIE 50:1 · TSV feedthroughs · Bio-MEMS
High-aspect-ratio DRIE CMOS-compatible TSV integration

Silicon offers capabilities unavailable in glass or polymer: DRIE creates high-aspect-ratio channels, pillars, and filter structures with near-vertical sidewalls at up to 50:1 aspect ratio, enabling size-based cell sorting, deterministic lateral displacement arrays, and nanofluidic confinement that polymer chips cannot achieve. Silicon also enables on-chip CMOS readout integration via TSV, connecting microfluidic sensors to signal conditioning circuits on the same die.

Standard semiconductor lithography (KrF stepper, mask aligner) provides sub-1 µm feature resolution. Thin film piezoelectric (PZT, AlN) and electrode materials are deposited on the same silicon substrate, enabling acoustic actuation, DEP trapping, and electrochemical detection. Glass-on-silicon hybrid chips (glass cover bonded anodically to Si channel layer) provide optical access through the glass while retaining silicon's structural precision.

DRIE 50:1 aspect ratio KrF / mask aligner litho TSV CMOS integration PZT · AlN piezoelectric Cell sorting · DLD arrays Glass-on-Si hybrid chips

Polymer

PDMS · PC · COP · PMMA · SU-8
Lowest cost Soft lithography Injection molded

Polymer chips dominate biomedical research and point-of-care diagnostics, not because they are technically superior, but because they are cheap, fast to prototype, and disposable. PDMS (polydimethylsiloxane) is the gold standard for research: bonded to glass or another PDMS layer by O₂ plasma activation, it forms the channels of organ-on-chip devices, droplet generators, and pneumatic valve arrays (Quake valves) within days of design iteration.

For production volumes, injection-molded PC, COP, and PMMA chips reproduce the reviewed channel design at lower cost than PDMS casting (draft, wall thickness and shrinkage are adjusted in the DFM review). COP (cyclo-olefin polymer) has negligible autofluorescence, critical for fluorescence-based assays where PDMS background interferes with detection. Thermal NIL on PMMA replicates nanostructures (gratings, nanopores, LSPR features) directly into polymer substrates for combined micro-nano chips.

PDMS soft lithography SU-8 master mold PC · COP · PMMA molding Thermal NIL on PMMA Quake pneumatic valves Low autofluorescence COP
Fabrication Techniques

Every technique needed for
micro-to-nano scale biochips

Biochip fabrication combines lithography, etching, thin film deposition, replication, and bonding, often on the same chip. All techniques are available, coordinated in a single project.

Building the Biochip: From Substrate to Sensing Layer, exploded 4-layer diagram showing microfluidic interface, active circuitry and electrodes, vias and interconnects, and base substrate

Photolithography

E-beam (20 nm), KrF stepper (~150 nm class, up to 12 inch), mask aligner (4 µm, up to 500 × 600 mm), and polymer film lithography (PET/PEN, 400 × 500 mm). Front-to-back alignment for double-sided microfluidic structures. SU-8 thick photoresist (up to 500 µm) for tall MEMS channel walls and master molds for PDMS soft lithography. Large-format mask aligner processes glass biochip arrays at 500 × 600 mm in a single step.

E-beam 20 nm KrF stepper / 12 inch Mask aligner 500 × 600 mm SU-8 up to 500 µm thick Front-to-back align

Wet & Dry Etching

HF etching of borosilicate and quartz glass for isotropic rounded microchannels, the standard for glass electrophoresis and DNA separation chips. KOH and TMAH anisotropic etching of silicon for V-groove and pyramidal structures. DRIE for high-aspect-ratio Si channels, through-holes, and micropillar filter arrays up to 50:1. ICP-RIE for glass and quartz with near-vertical sidewalls. KOH or TMAH etching gives smooth {111} facets for single-molecule nanofluidics; channel roughness is confirmed per program.

HF glass, isotropic channels KOH · TMAH Si etch DRIE 50:1 aspect ratio ICP-RIE glass, vertical walls Ra <0.5 nm nanofluidics

Nanoimprinting (NIL)

UV and thermal nanoimprint lithography for sub-50 nm nanostructures integrated into biochip substrates. DNA sequencing nanopore arrays: NIL defines the nanopore geometry in resist, dry etch transfers to SiN membrane. LSPR biosensor chips: NIL patterns gold nanopillar or nanohole arrays for label-free plasmon-resonance sensing. Thermal NIL on PMMA for polymer biochips with nanofluidic confinement channels. Master mold fabrication (Si e-beam, Ni electroformed).

UV-NIL soft mold Thermal NIL, PMMA DNA nanopores <50 nm LSPR Au nanostructures Si/Ni master molds

Thin-Film Electrodes

Biocompatible electrode metals deposited by PVD sputtering and e-beam evaporation: gold (Au) for thiol-chemistry biofunctionalization, platinum (Pt) for electrochemical detection and electroporation, ITO (indium tin oxide) for transparent electrodes compatible with optical detection through the electrode, and TiN for capacitive sensing. Lift-off patterning defines electrode arrays with sub-5 µm features. Multi-electrode arrays (MEA) for neural recording chips fabricated on glass or Si substrates.

Au, thiol biofunctionalization Pt, electrochemical ITO, transparent electrode TiN, capacitive sensing Lift-off, sub-5 µm features MEA for neural chips

PDMS Soft Lithography

The standard rapid-prototyping route for research-grade microfluidic chips. SU-8 photolithography on a silicon wafer defines the channel master mold, channel heights from 5 µm to 500 µm. Liquid PDMS is poured over the master, degassed, cured at 70 °C, and peeled off, producing a negative replica of the channels in transparent, flexible PDMS. Multiple PDMS layers are bonded by O₂ plasma activation to create three-dimensional channel networks, pneumatic valves (Quake valve architecture), and organ-on-chip structures. Design-to-first-chip turnaround: 3 to 5 days once the SU-8 master is available, scope agreed per project.

SU-8 master on Si Channel height 5 to 500 µm O₂ plasma bonding Quake pneumatic valves 3-5 days after master Organ-on-chip capable

Injection Molding & Thermal NIL

For production volumes (thousands to millions of chips), injection molding of PC, COP, and PMMA produces biochip substrates at cents-per-chip, far below the cost of individually cast PDMS or etched glass chips. We fabricate the injection mold tooling (Si or Ni master). Thermal NIL on PMMA replicates nanoscale features (100 nm to 5 µm gratings, nanopore templates, nanowell arrays) directly during molding, combining micro and nano features in a single fabrication step.

PC · COP · PMMA molding Si / Ni mold tooling Thermal NIL on PMMA Nanofeatures during molding Production scale
Nanoscale Bio Structures

Sub-50 nm structures for DNA,
single molecules, and plasmonics

Biochip applications increasingly require nanoscale features invisible to standard UV lithography. Our NIL and e-beam capabilities bring sub-50 nm resolution to biochip fabrication at production-relevant scales.

Nanoscale capability for biochips
The nanoscale is where biology happens, and where many foundries stop
DNA is 2 nm wide. Proteins are 5 to 50 nm. Ion channels are <1 nm. Making biochips that interact with biology at its native scale requires nanofabrication, not just microfluidics. NIL, e-beam, and DRIE capabilities enable nanostructures to be integrated directly into microfluidic chips within one project.
SEM micrograph of a DNA nanopore, 10 nm scale freestanding SiN membrane nanopore, 5 to 50 nm diameter
DNA Nanopores
Geometry5 to 50 nm diameter
MaterialFreestanding SiN or Si₃N₄ membrane
ApplicationUniform pore arrays for nanopore sequencing and molecular sieving
SEM micrograph of LSPR nanostructures, Au pillars, holes, and crescents at 50 to 200 nm scale patterned by NIL and lift-off, 100 nm scale bar
LSPR Nanostructures
GeometryAu pillars, holes, and crescents at 50 to 200 nm
MethodologyPatterned by NIL and lift-off
ApplicationLocalized surface plasmon resonance for label-free biosensing. Antibody or aptamer functionalized for protein or nucleic acid detection
SEM micrograph of nanofluidic channels, sub-100 nm channel depth, 500 nm scale bar, defined via e-beam lithography and DRIE
Nanofluidic Channels
GeometrySub-100 nm channel depth
MethodologyDefined via e-beam lithography and DRIE
ApplicationConfinement channels for single DNA molecule stretching, entropy-reduction mapping, and nano-coulter counters for nanoparticle detection
SEM micrograph of nanowell array, femtoliter-volume uniform wells in PMMA or COP, millions of wells per chip patterned by NIL
Nanowell Arrays
GeometryFemtoliter-volume defined in PMMA or COP
MethodologyNIL on polymer
ApplicationDigital ELISA single-molecule enzyme assays. Millions of wells per chip achieved at production cost
NIL master mold fabrication, Si e-beam and Ni electroformed
Sub-50 nm nanopores for nanopore sequencing applications
LSPR gold nanostructure arrays: pillars, holes, crescents
Nanofluidic channel integration alongside microfluidic channels
Thermal NIL on PMMA for polymer nanowell arrays
E-beam direct-write for custom nanoscale geometries (no mask)
SiN membrane fabrication for nanopore and nanomechanical sensors
Pattern transfer to glass, Si, and polymer substrates
Chip Sealing & Bonding

Six bonding methods, matched
to your substrate combination

Bonding seals the microfluidic channels and is the step that most often determines chip yield. The wrong bonding method causes channel collapse, delamination, or optical scattering. We offer every relevant bonding method, matched to the substrate combination and application requirement.

PDMS ↔ Glass
O₂ plasma activation of both surfaces followed by contact bonding. The industry standard for lab-on-chip research devices. Optically clear, biocompatible, and reversible before plasma activation, enabling chip inspection and testing before permanent seal. Bond strength: ~200 kPa burst pressure.
O₂ plasmaOptically clearResearch standard
PDMS ↔ PDMS
Plasma bonding of two PDMS layers for multilayer microfluidic chips. Enables Quake-valve pneumatic control channel networks above fluidic channels. Critical for organ-on-chip devices with separate media and air/vacuum control circuits. Thin PDMS membranes (5 to 20 µm) form the valve diaphragm.
O₂ plasmaMultilayerQuake valves
PDMS ↔ SUS / Metal
PDMS bonded to stainless steel or aluminum backing for robust, reusable microfluidic fixtures. Metal backing provides mechanical rigidity for pressure-tolerant flow cells, electrophoresis clamps, and portable diagnostic devices that cannot use fragile glass or flexible PDMS-only chips.
Adhesive layerRobustReusable
Glass ↔ Silicon (Anodic)
Anodic bonding at 250 to 450 °C under electrostatic field, creates true hermetic glass-Si seals without intermediate adhesive. The standard for MEMS microfluidic sensors, pressure sensors integrated into flow channels, and glass-capped Si DRIE chips requiring autoclave sterilization compatibility. Triple-stack glass-Si-glass available.
250 to 450 °CHermetic-capable (leak test confirms)Autoclave-compatible
Glass ↔ Glass (Fusion)
Plasma-activated direct fusion bonding of glass-to-glass for the cleanest possible optically transparent chips, no adhesive layer in the optical path. Surface roughness must be <0.5 nm Ra (CMP-polished) before bonding. Used for DNA sequencing flow cells, high-pressure capillary electrophoresis chips, and UV-excited fluorescence chips where any adhesive autofluorescence is unacceptable.
Plasma-activatedNo adhesiveUV-transparent
PC / COP / PMMA Thermal
Thermal bonding of rigid thermoplastic chips by pressing slightly above glass transition temperature, fusing the two halves without adhesive. Compatible with injection-molded chips where adhesive residue in channels would interfere with surface chemistry or clog nanoscale features. UV adhesive bonding available for lower-temperature polymers.
Thermal pressNo adhesiveInjection molded
Substrate Comparison

Glass, silicon, and polymer key parameters side by side

ParameterGlassSiliconPolymer (PDMS/PC/COP)
Max Substrate Size500 × 600 mm panelUp to 12 inch (300 mm)PDMS: cast; Mold: up to 12 inch
Channel PatterningHF wet etch, ICP-RIE, laserDRIE (50:1), KOH, TMAHSoft litho (PDMS), injection mold, NIL
Min Feature Size~2 µm (ICP-RIE)~0.5 µm (DRIE)~5 µm (mold); <100 nm (NIL)
Optical TransparencyExcellent (UV to NIR)Opaque (IR only)PDMS: excellent; COP: very good
Chemical ResistanceExcellent, inert to most solventsExcellent (oxide passivated)PDMS: swells in organics; COP: good
BiocompatibilityExcellent, medical-device (biocompatibility evaluated per program)Good (oxide surface)PDMS: excellent; polyimide: medical-grade PI available (biocompatibility evaluated per program)
Thermal StabilityBorosilicate to ~500 °C; fused silica well above 1000 °CUp to 1000 °CPDMS: typically to ~150 to 200 °C; PI: grade-dependent (cure and service temperatures qualified per stack and duration)
Electrode IntegrationAu, Pt, ITO, direct depositionAu, Pt, TiN, standard CMOSLimited, low-temp metals only
CMOS IntegrationVia TSV in hybrid chipNative, same waferNo
Bonding MethodsAnodic, fusion, adhesiveAnodic (to glass), fusionO₂ plasma (PDMS), thermal (PC/COP)
Cost (per chip)Medium, low at 500 × 600 mm scaleMedium-highLowest (PDMS research; mold: very low)
Prototype Turnaround1-3 weeks2-4 weeksPDMS: 3-5 days after master; mold: 4-8 weeks
Applications

Life sciences, diagnostics,
and biomedical devices

DNA Sequencing Flow Cells

Glass flow cells with NIL-defined nanopore arrays and precision microchannels for nanopore sequencing and optical sequencing platforms. Fusion or anodic bonding provides the hermetic seal and UV transparency required. Large-format glass processing enables 96-well or 384-well array formats at competitive cost.

Glass fusion bond · NIL nanopores · 500 × 600 mm · UV-transparent

Point-of-Care Diagnostics

COP injection-molded chips for lateral flow assay, RT-PCR, immunoassay, and CRISPR-based diagnostics. COP's low autofluorescence enables fluorescence readout. PDMS prototype geometry can inform the COP production design; wall thickness, draft, demolding, bonding, shrinkage and surface chemistry are reviewed before transfer. Thousands to millions of chips per batch at production cost.

COP injection mold · LFA · RT-PCR · CRISPR assay · Low autofluorescence

Organ-on-a-Chip / OOC

Multilayer PDMS chips with Quake pneumatic valves, peristaltic pumps, and mechanical stretch membranes for microphysiological systems, lung, gut, blood-brain barrier, and kidney-on-chip. PDMS-to-PDMS plasma bonding creates three-dimensional vascular and tissue channel networks. COP versions available for mass production.

PDMS multilayer · Quake valves · Pneumatic stretch · OOC / MPS

LSPR Label-Free Biosensors

Gold nanostructure arrays (nanopillars, nanoholes, nanoslits) on glass substrates by NIL and lift-off. Surface functionalized with antibodies, aptamers, or nucleic acid probes. Localized surface plasmon resonance detects binding of target molecules, protein, nucleic acid, or small molecule, without fluorescent labels. For clinical diagnostics and drug discovery.

NIL + Au lift-off · LSPR · Label-free · Antibody / aptamer probe

Cell Sorting & DEP Trapping

Silicon DRIE micropillar arrays for deterministic lateral displacement (DLD) size-based cell sorting. ITO or Pt electrode arrays on glass for dielectrophoretic (DEP) trapping and manipulation. Tumor cell isolation from blood, circulating tumor DNA (ctDNA) concentration, and rare cell analysis for liquid biopsy applications.

DRIE micropillars · DLD · DEP electrodes · ITO/Pt · Liquid biopsy

Neural Recording Chips (MEA)

Multi-electrode arrays (MEA) for neural signal recording and stimulation, Pt or TiN electrodes on glass or Si substrate, passivated with SU-8 or polyimide, with DRIE through-holes for neuron interface. Biocompatible polyimide RDL for flexible implantable probe variants. For brain-computer interface research and epilepsy monitoring.

Pt / TiN MEA · SU-8 passivation · DRIE · PI RDL · BCI

Single-Molecule Analysis

E-beam patterned nanofluidic channels (<100 nm depth) for DNA stretching and single-molecule fluorescence mapping. Zero-mode waveguides (ZMW) patterned by e-beam or NIL in gold film for single-molecule sequencing by synthesis. Nanowell arrays (femtoliter volume) for digital ELISA and single-enzyme assays.

E-beam <100 nm channels · ZMW in Au film · Nanowell arrays · Digital ELISA

Drug Delivery & Microencapsulation

PDMS and glass droplet microfluidic chips for monodisperse emulsion generation, microencapsulation, and drug-loaded microsphere production. T-junction and flow-focusing geometries produce droplets from 5 µm to 500 µm with CV <2%. Glass chips preferred for surfactant-tolerant surfaces and elevated temperature operation.

PDMS / glass · Droplet microfluidics · T-junction · Flow focusing · CV <2%

Cell Culture & Perfusion

Large-format glass multi-well plates and flow-through cell culture chambers, processed on 500 × 600 mm glass panels for cost-effective production of multi-channel cell culture arrays. Integrated Au or ITO electrodes for transepithelial electrical resistance (TEER) measurement. SU-8 cell culture scaffold structures for 3D spheroid culture.

500 × 600 mm glass · Multi-well plates · Au/ITO TEER · SU-8 3D scaffold
Why Nanosystems JP Inc.

What makes our biochip capability
different

01

500 × 600 mm glass, lowest chip cost

Processing biochip substrates at 500 × 600 mm panel scale produces far more chips per run than 4- or 6-inch wafer formats. For array biosensors and diagnostic plates with hundreds of chips per substrate, this single capability can reduce chip cost by 5-10× compared to wafer-scale foundries.

02

Nano to micro, one coordinated process flow

Sub-50 nm NIL nanopores integrated into microfluidic chips, scheduled within the same project as the microfluidic layers. E-beam direct write for custom nanoscale geometries. Nanofluidic + microfluidic hybrid chip design is handled by one engineering team with a single project timeline.

03

All three substrate families

Glass for optical biochips, silicon for Bio-MEMS and CMOS integration, PDMS for soft lithography prototypes, COP/PC/PMMA for injection-molded production. The material choice is driven by your device requirement, not by what the foundry happens to process.

04

PDMS to production, reviewed transfer

Prototype in PDMS (3 to 5 day turnaround subject to master availability and scope), then transition to injection-molded COP or PC; wall thickness, draft, demolding, bonding, shrinkage and surface chemistry are reviewed before transfer. Mold tooling is included in the program, and the channel design is carried from soft lithography to molded production with the adjustments identified in that review.

05

All bonding methods

O₂ plasma for PDMS-glass and PDMS-PDMS, anodic for glass-Si hermetic, fusion for glass-glass UV-transparent, thermal for PC/COP, all six bonding methods available. Chip sealing is included in the same project as the upstream device fabrication. Bond quality verified by optical inspection and leak testing before delivery.

06

NDA available on request

Biochip designs, channel layouts, electrode geometries, surface chemistry protocols, and assay designs, represent years of development. An NDA can be arranged before any design files or technical details are shared, just mention it in your first message. Initial inquiries and quotes can proceed without one. Pure-play foundry: we do not develop competing biochip products.

Related service

AuSn Bump Services: For photonic biochips requiring flip-chip assembly of laser sources or photodetectors, our AuSn bump service provides hermetic fluxless bonding at wafer scale.

AuSn Bump Services →

Start your project.
Initial response typically within one business day.

Share your process requirements, substrate, and production volume. A Nanosystems JP Inc. engineer will give an initial response typically within one business day. Full quote typically within 7-10 business days, subject to project complexity and NDA requirements.

To speed up technical review, please include:
substrate type & size  ·  target process  ·  quantity  ·  timeline  ·  design files if available (not required for first review)

sales@nanosystemsjp.co.jp · +81-3-5288-5569 · NDA available on request

Ready to discuss this process?
Initial engineering response: typically within one business day. NDA available.
Request a Quote →
Services & Industries
Capabilities Overview
Substrates
Substrate & WafersSi, SiC, GaN, glass, sapphire Fused Silica WafersQuartz · borosilicate · low CTE Glass ProcessingDrilling, etching, polishing PI Film & SUS Sensor FabRoll-to-roll · sensor patterning
Front-End
Mask FabricationGDS to chrome mask, DRC PhotolithographyE-beam 20 nm to 500 × 600 mm NanoimprintingUV & thermal NIL Thin Film DepositionPVD, CVD, ALD, MBE ALD CoatingConformal oxides, nitrides PECVD DielectricsSiO₂, SiN, SiON, a-Si TFT & BackplaneIGZO · Glass · Display Lift-OffMetal pattern · shadow mask ElectroplatingCu TSV fill, DPC, LIGA Electroforming & LIGANi shims, meshes, microstructures EtchingICP-RIE, DRIE >50:1 ICP-RIE EtchingSi, oxide, III-V, SiC, quartz MEMS FoundrySensors, actuators, microfluidics Microchannel CoolingEtched, bonded, heater test chips Thermal Test ChipsHeater dies, multi-zone, RTD Temperature SensorsPt/NiCr RTDs, thermocouples AnnealingN₂ / H₂ / vacuum / RTA Ion ImplantationB / P / As / Al / N implant CMP & GrindingCu CMP, 50 µm thinning Wafer ThinningTo 50 µm on carriers Backside MetallizationTi/Ni/Ag, Ti/Ni/Au, Ti/Cu Patterned Test WafersCustom CMP and process evaluation wafers Daisy-Chain Test DiesDummy dies, chains, bump options DicingBlade, stealth laser Stealth & Laser Dicing300 mm Si and glass, SDBG Wafer CleaningRCA, plasma, megasonic Cleaning ChemistryPiranha, SC-1, SC-2, RCA
Advanced Packaging
Wafer BondingHybrid, eutectic, fusion Anodic BondingGlass to silicon, cavities MEMS Cap WafersCavities, ports, seal lands, bonded TSV FabricationHigh AR, Cu fill InterposersSi and glass, TSV/TGV + RDL TSV RevealBackgrind → etch → CMP TGV FabricationThrough-glass via Glass TGV CouponsHole-only to routed prototypes RDL FabricationBCB / PBO / PI + damascene Packaging & AssemblyWire bond, flip-chip Flip-Chip BondingTC, reflow, AuSn, underfill 3D / 2.5D PackagingTSV + RDL + UBM + C4 AuSn BumpPVD lift-off, fluxless Laser SubmountsSi/AlN submounts, optical benches Indium BumpEvap lift-off · cryo/quantum UBM DepositionTi/Pt/Au · adhesion-barrier-Au Cu Pillar & SnAg BumpingPillars with SnAg caps, SnAg bumps Gold BumpEvap & plated · Au-Au TC AuGe / AuSi361/363 °C eutectic die attach High-Pb Bumps95Pb5Sn · hi-rel C4 SLID / TLPCu/Sn · Au/In · Ag/In Al-Ge Sealing424 °C · CMOS-friendly MEMS Ohmic ContactsGaAs · GaN · RTA + TLM SiC ProcessingThinning, films, contacts, dicing GaN & III-VGaN, GaAs, InP processing Cryo / UHV MetalAuSn · Ti/Pd/Au · rings Optical AccessWindows · meshes · holes Vapor CellsDRIE + bond · unfilled TFOI WafersQuartz-on-Si · LNOI Biochip & MicrofluidicsGlass 500 × 600 mm, NIL SiPho PackagingTSV · RDL · UBM · C4 for PIC Photonic DevicesSiN/SOI waveguides, gratings
Industries
AI & HPC PackagingCoWoS-style, 2.5D / 3D Silicon PhotonicsSOI · AuSn · TSV interposer AutomotiveMEMS sensors, SiC power Life SciencesLab-on-chip, biosensors All Industries → Request a Quote →