Startups & Innovators

Startup
Foundry Services

From first wafer to first product, Nanosystems JP Inc. supports hardware startups with low-volume fabrication, fast turnaround, and engineering guidance at every stage. No minimum lot size. NDA available on request. Device concept to prototype in under 45 days for standard single-process flows, counted from confirmed design data and substrates; multi-process flows are scheduled at quotation.

Have full specs ready? Submit a detailed Technical RFQ →

From 1-5 wafersNo minimum lot<45 days prototype (standard flows)NDA availableEnglish engineers20 processes IP fully protectedConcept to chip
1 wafer
Minimum run size, prototype from one
45 days
Turnaround for a standard single-process flow; multi-mask flows quoted per program
20+
Process capabilities, one PM
NDA
Before first technical discussion
The Startup Fabrication Problem
Equipment and know-how, the two gaps between idea and prototype

Most hardware startups have the idea, the team, and even the funding.

But building MEMS sensors, photonic chips, or microfluidic devices requires access to multimillion-dollar cleanroom facilities and deeply experienced process engineers.

Nanosystems JP Inc. bridges that gap, providing advanced fabrication infrastructure and the expertise needed to turn complex designs into reality, giving you direct access to advanced fabrication without the overhead.

You Have the Idea, We Have the Process Access

Developing a new MEMS pressure sensor, photonic biosensor, or SiC power chip requires ICP-RIE etchers, KrF steppers, PECVD systems, ion implanters, and packaging equipment. Building that capability yourself is out of reach for most startups.
Nanosystems JP Inc. gives you access to these processes from your very first wafer.

No capex requiredFull process setFrom the first waferMEMS to SiC to photonics

You Have the Vision, We Have the Process Knowledge

Knowing which etch recipe produces the right MEMS sidewall angle, which barrier layer prevents Cu diffusion into your dielectric, or which anneal temperature activates dopants without moving them, this process knowledge takes years to develop. Our engineers bring this knowledge to your project from the first consultation.

Process engineering supportDevice physics guidanceRecipe optimizationYears of experience

You Need Speed: About 45 Days for Standard Flows

Standard single-process prototypes can ship in about 45 days after confirmed design data and substrate receipt; multi-mask and integrated flows receive a project-specific schedule. Fast iteration matters more than anything else in early-stage hardware development, each design loop teaches you more than any simulation.

About 45 days, single-process flowMulti-mask flows scheduled per projectFast iteration

Your IP is Protected

Pure-play foundry model: we do not design, manufacture, or sell devices that compete with our customers. Your design files, process specifications, mask layouts, and device performance data remain confidential under NDA. We do not share customer information between projects. Japan-based IP protection with strong legal framework.

Pure-play, no competing productsNDA available on requestDesign files confidentialJapan IP protection

English-Speaking Engineers

Located in Tokyo, serving global customers entirely in English. Technical consultation, process quotation, engineering support, and project updates all in English. No translation overhead or cultural barrier between your device concept and the engineers who fabricate it.

Tokyo JapanFull English serviceGlobal customersNo translation overhead

Scale When You Are Ready

Start with 1-5 prototype wafers. Move to 10-25 engineering lot wafers for design verification. Scale to production volumes when your design is locked. Repeat fabrication runs on the established baseline recipe. Your prototype data is your production baseline, no re-spin.

1-5 wafer prototype10-25 engineering lotOne recipe from prototype to repeat lots
What We Fabricate for Startups
Any device that requires semiconductor-grade precision

MEMS Sensors & Actuators

Accelerometers, gyroscopes, pressure sensors, MEMS microphones, gas sensors, and MEMS mirrors. DRIE, thin film deposition, wafer bonding, and packaging, the full MEMS process flow. Ideal for IoT sensors, wearables, drones, AR/VR, and industrial sensing startups.

DRIE MEMSWafer bondingIMU · Pressure · MicrophoneIoT · Wearable · Drone

Silicon Photonics PICs

SOI waveguides, grating couplers, ring resonators, and AuSn laser flip-chip integration for optical communication, LiDAR, spectroscopy, and optical biosensing chips. For startups developing next-generation optical transceivers, photonic sensors, or integrated quantum photonic devices.

SOI waveguidesICP-RIE etchAuSn laser flip-chipLiDAR · Sensing · QKD

Biochip & Microfluidics

PDMS lab-on-chip for biotech startups developing point-of-care diagnostics, organ-on-chip platforms, DNA sequencing devices, or biosensors. 3-5 day PDMS prototype turnaround. Large-format glass for low-cost biosensor arrays. LSPR nanopore chips by NIL.

PDMS 3-5 daysNIL nanoporesPOC diagnosticsOrgan-on-chip

Power Semiconductors

SiC MOSFET and GaN HEMT fabrication for power electronics startups developing EV chargers, solar inverters, motor drives, and industrial power conversion. Selected SiC fabrication modules: ion implantation, high-temperature activation annealing, etching, metallization, and packaging; gate-oxide formation, nitridation and reliability qualification are reviewed as a separate development scope.

SiC process modulesGaN HEMTIon implant + annealEV · Solar · Industrial

RF & mmWave Devices

GaAs, InP, and GaN MMIC fabrication for RF startups developing 5G/6G front-end modules, satellite communication chips, or mmWave radar sensors. Precise gate length lithography, ohmic contact annealing, and BCB low-k passivation for mmWave performance.

GaAs · InP · GaN MMICBCB low-k5G/6G · Satellite · Radar

Research Prototypes (Any Device)

If your device requires semiconductor-grade cleanroom fabrication and does not fit neatly into the categories above, contact us. We have fabricated devices for quantum computing, metamaterial research, MEMS energy harvesters, photonic neural networks, and more. If it needs a cleanroom, we can likely help.

Any deviceQuantum · MetamaterialNovel MEMSResearch to prototype
How We Work With You
From concept to first wafer
1️⃣

NDA Available Before Technical Discussion

If you prefer to share design files, device schematics, or process requirements under NDA, we can arrange one before any details are exchanged, just mention it in your first message. Initial inquiries can proceed without one. We can schedule a technical consultation at any stage. No commitment required for the first discussion.

2️⃣

Process Recommendation & Quote

Our engineers identify the process flow that achieves your device specifications within your timeline and budget. We quote the full flow, not just individual process steps. Transparent pricing with no hidden fees for standard processes.

3️⃣

Mask Design Review

For lithography-based processes, we review your mask design for DRC (design rule compliance), alignment mark placement, and dicing street width before mask fabrication begins. Catching design issues before mask-out saves weeks.

4️⃣

Fabrication & Weekly Updates

Fabrication begins. You receive regular progress updates with process data (etch depth, film thickness, CD measurements) at each key step. Non-conformances are reported immediately, not discovered at final test.

5️⃣

Prototype Delivery & Iteration

First prototype wafers delivered with a complete process data sheet. If the device performance requires process adjustment, we iterate on the same wafers or a new 1-wafer run, same recipe, fast turnaround, no minimum lot penalty.

6️⃣

Scale to Production

When your design is locked and performance verified, scale to engineering lot (10-25 wafers) then production. Same process recipe. Your prototype data is your production baseline.

Why Nanosystems JP Inc. for Startups
The foundry built for the speed of startup hardware development
01

From 1-5 wafers, truly

Every process we offer is available from a single prototype wafer. No 25-wafer minimum lot. No engineering wafer fee that makes small-volume prototyping uneconomical. One wafer tells you whether your device concept works.

02

About 45 days for standard single-process flows

A standard single-process prototype can deliver first wafers in about 45 days after design data and substrates are confirmed; multi-mask MEMS or photonic flows are scheduled per project. Fast enough to iterate several times in a year.

03

All 20 processes

DRIE to PECVD to ion implant to wafer bonding to TSV to packaging, all managed as one project. No coordination delays between process steps. One schedule, one project.

04

NDA and IP protection on request

An NDA is available if you prefer to share technical information under a formal agreement. Your mask layouts, device structures, and process specifications remain confidential throughout and after the project regardless.

05

English-speaking process engineers

Technical support in English from engineers who understand device physics, not a sales desk relaying questions to engineers. Direct access to the people making your device.

06

Pure-play, we do not compete with you

Nanosystems JP Inc. does not design or sell semiconductor devices. We fabricate devices for our customers. Your product concept is safe here, we have no commercial incentive to develop competing devices.

Start your project.
Initial response typically within one business day.

Share your process requirements, substrate, and production volume. A Nanosystems JP Inc. engineer will give an initial response typically within one business day. Full quote typically within 7-10 business days, subject to project complexity and NDA requirements.

To speed up technical review, please include:
substrate type & size  ·  target process  ·  quantity  ·  timeline  ·  design files if available (not required for first review)

sales@nanosystemsjp.co.jp · +81-3-5288-5569 · NDA available

Services & Industries
Capabilities Overview
Substrates
Substrate & WafersSi, SiC, GaN, glass, sapphire Fused Silica WafersQuartz · borosilicate · low CTE Glass ProcessingDrilling, etching, polishing PI Film & SUS Sensor FabRoll-to-roll · sensor patterning
Front-End
Mask FabricationGDS to chrome mask, DRC PhotolithographyE-beam 20 nm to 500 × 600 mm NanoimprintingUV & thermal NIL Thin Film DepositionPVD, CVD, ALD, MBE ALD CoatingConformal oxides, nitrides PECVD DielectricsSiO₂, SiN, SiON, a-Si TFT & BackplaneIGZO · Glass · Display Lift-OffMetal pattern · shadow mask ElectroplatingCu TSV fill, DPC, LIGA Electroforming & LIGANi shims, meshes, microstructures EtchingICP-RIE, DRIE >50:1 ICP-RIE EtchingSi, oxide, III-V, SiC, quartz MEMS FoundrySensors, actuators, microfluidics Microchannel CoolingEtched, bonded, heater test chips Thermal Test ChipsHeater dies, multi-zone, RTD Temperature SensorsPt/NiCr RTDs, thermocouples AnnealingN₂ / H₂ / vacuum / RTA Ion ImplantationB / P / As / Al / N implant CMP & GrindingCu CMP, 50 µm thinning Wafer ThinningTo 50 µm on carriers Backside MetallizationTi/Ni/Ag, Ti/Ni/Au, Ti/Cu Patterned Test WafersCustom CMP and process evaluation wafers Daisy-Chain Test DiesDummy dies, chains, bump options DicingBlade, stealth laser Stealth & Laser Dicing300 mm Si and glass, SDBG Wafer CleaningRCA, plasma, megasonic Cleaning ChemistryPiranha, SC-1, SC-2, RCA
Advanced Packaging
Wafer BondingHybrid, eutectic, fusion Anodic BondingGlass to silicon, cavities MEMS Cap WafersCavities, ports, seal lands, bonded TSV FabricationHigh AR, Cu fill InterposersSi and glass, TSV/TGV + RDL TSV RevealBackgrind → etch → CMP TGV FabricationThrough-glass via Glass TGV CouponsHole-only to routed prototypes RDL FabricationBCB / PBO / PI + damascene Packaging & AssemblyWire bond, flip-chip Flip-Chip BondingTC, reflow, AuSn, underfill 3D / 2.5D PackagingTSV + RDL + UBM + C4 AuSn BumpPVD lift-off, fluxless Laser SubmountsSi/AlN submounts, optical benches Indium BumpEvap lift-off · cryo/quantum UBM DepositionTi/Pt/Au · adhesion-barrier-Au Cu Pillar & SnAg BumpingPillars with SnAg caps, SnAg bumps Gold BumpEvap & plated · Au-Au TC AuGe / AuSi361/363 °C eutectic die attach High-Pb Bumps95Pb5Sn · hi-rel C4 SLID / TLPCu/Sn · Au/In · Ag/In Al-Ge Sealing424 °C · CMOS-friendly MEMS Ohmic ContactsGaAs · GaN · RTA + TLM SiC ProcessingThinning, films, contacts, dicing GaN & III-VGaN, GaAs, InP processing Cryo / UHV MetalAuSn · Ti/Pd/Au · rings Optical AccessWindows · meshes · holes Vapor CellsDRIE + bond · unfilled TFOI WafersQuartz-on-Si · LNOI Biochip & MicrofluidicsGlass 500 × 600 mm, NIL SiPho PackagingTSV · RDL · UBM · C4 for PIC Photonic DevicesSiN/SOI waveguides, gratings
Industries
AI & HPC PackagingCoWoS-style, 2.5D / 3D Silicon PhotonicsSOI · AuSn · TSV interposer AutomotiveMEMS sensors, SiC power Life SciencesLab-on-chip, biosensors All Industries → Request a Quote →