Quantum Offerings, Optical Access Components

Optical Access Components
Windows, Apertures & Meshes

At Nanosystems JP Inc., we fabricate the small optical parts quantum and sensing hardware cannot buy off the shelf: double-side patterned windows, Ti/Au films, metal apertures, and fine meshes on sapphire and fused silica, through-glass holes by unfilled TGV, and Si-glass bonded cell bodies. Representative delivered work: Ti/Au patterned fused silica windows and an aluminum mesh on sapphire with 1.3 µm-class openings. This page highlights capabilities that have already been delivered. From single pieces and single wafers, managed end to end by a dedicated project manager.

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Fused silica & sapphire Double-side patterning Ti/Au · Al · apertures Meshes to ~1 µm holes Through-glass holes Bonded cell bodies Shipped-work heritage From 1 piece
1.3 µm
Through-hole Al mesh
shipped on sapphire
2
Sides patterned, aligned
front to back
<5 µm
TTV on precision-grade
fused silica
1
Piece minimum -
experiment-friendly
The Sourcing Gap

Bridging optical fabrication and semiconductor patterning.

A patterned window falls between two industries: optics houses supply beautiful blanks but no lithography, and most fabs will not touch a 0.5 mm fused silica disc. Our fused silica wafer program plus full lithography closes the gap, one order, one drawing, one part number.

Quantum Technology Hub →
What We Make

Micron patterns on
optical-grade transparent parts

Three capabilities define the service, and each one has already left the building on a customer's part.

Patterned Windows, Both Sides

Ti/Au electrodes, contact pads, alignment fiducials, and opaque field masks patterned directly on fused silica and sapphire windows, on one face or both, aligned front to back. We have shipped Ti/Au on fused silica; polishing, thickness tolerance to ±10 µm, and TTV below 5 µm on precision grades come through the fused silica wafer program the windows are cut from.

Ti/Au on silica: shipped Double-side aligned ±10 µm thickness tol. <5 µm TTV precision grade

Apertures & Fine Meshes

Metal apertures, beam-defining stops, and periodic meshes by lift-off on transparent substrates, down to aluminum meshes with 1.3 µm-class openings we delivered on sapphire. Hole size, pitch, and fill factor per your optical design, in Al, Ti/Au, or other evaporable metals, with the pattern placed to your fiducials.

1.3 µm holes: shipped Al · Ti/Au · more Pitch & fill per design Fiducial-registered

Holes, Cavities & Bonded Bodies

Through-glass holes by unfilled TGV for beam access and fill ports, DRIE cavities in silicon, and Si-glass stacks joined by anodic, adhesive, or eutectic bonding, the building blocks of cells, chambers, and windowed housings. Coatings, including the SiO₂/TiO₂ AR stacks of our photonics flow, are coordinated per program.

Unfilled TGV holes Anodic · adhesive · eutectic Cells & chambers AR stacks per program
Part Sketch

A patterned window,
annotated

One drawing of the part this page sells: electrodes on top, aperture on the back, a through-glass hole, and a 1.3 µm-class mesh in the inset.

Fused silica / sapphireTi/Au electrodes (top)Aperture mask (bottom) · back-alignedUnfilled TGV · Ø20 µm classAl mesh on sapphire1.3 µm-class holesDouble-side alignedChip-scale rectanglesAR SiO₂/TiO₂ per programOptics-grade packing
Sample fabrication sketch · not to scale
Process Specifications

Complete optical access
parameters

ParameterSpecification
SubstratesFused silica, sapphire, borosilicate glass, Si for bodies; others on request
FormatsWafers 4 to 8 inch; chip-scale rectangles and discs per drawing
MetalsTi/Au, Al, Cr, and other evaporable systems; lift-off patterned
Feature SizesMesh holes from ~1 µm class (1.3 µm shipped); apertures and pads per design
SidesSingle or double, front-to-back aligned
Thickness / Flatness±10 µm thickness tolerance; <5 µm TTV on precision-grade fused silica
Through-HolesUnfilled TGV in glass / fused silica, Ø20 µm class standard; Cu fill optional
BondingAnodic, adhesive, eutectic Si-glass stacks; open halves or bonded bodies
CoatingsAR (SiO₂/TiO₂ class) and functional coatings coordinated per program
DeliverableFinished parts: patterned, cut, inspected, optics-packed
Minimum LotFrom 1 piece or 1 wafer; repeat lots on the same recipe
Applications

Optical access across quantum
and precision sensing

Vapor & Vacuum Cell Windows

Patterned windows and bonded bodies for alkali vapor cells and miniature vacuum chambers, electrode-carrying glass where the physics wants field plates right at the volume.

Cell windows · Electrode glass · Bonded bodies

Trap & Beam Optics

Apertures, beam stops, and through-holes that define and admit laser paths in ion and atom hardware, positioned to the same fiducials as the electrical pattern.

Beam definition · Laser access · Fiducial-registered

Field Meshes & Grids

Fine conductive meshes on transparent substrates where a field or shield must coexist with a view, the shipped 1.3 µm sapphire mesh being exactly this part.

Transparent electrodes · Shield grids · ~1 µm holes

Spectroscopy & Analytics

Windowed flow cells, patterned reference apertures, and chambered optics for instruments, drawing on the same Si-glass bonding as the microfluidics service.

Flow cells · Instrument optics · Microfluidics heritage

Compact & Fieldable Sensors

Miniaturized optical assemblies for OPMs, clocks, and deployable sensors, where every part must be batch-fabricated, not hand-made, to reach volume.

OPM · clock optics · Batch-fabricated parts

One-Off Experiment Parts

Single windows, single meshes, single bonded chambers from a sketch and a phone call, the parts that otherwise hold up a research program for months.

From 1 piece · From a sketch · Fast quotes
Anatomy of a Patterned Window · Cross-Section
fused silica / sapphireTi/Au electrodes · topaperture mask · back-alignedunfilled TGV hole~1 µm meshBoth faces patterned and aligned to each otherChip-scale rectangles · AR coats per program · Not to scale
Why Nanosystems JP Inc.

What makes our optical access capability
different

01

Shipped, not speculative

Ti/Au fused silica windows and the 1.3 µm sapphire mesh are delivered parts. These examples illustrate parts delivered through this service.

02

Optics and lithography, one order

Substrate, polish grade, pattern, holes, bond, and dicing on one part number, closing the gap between optics houses and fabs.

03

Double-side as a discipline

Front-to-back alignment is routine here, so electrode-and-aperture pairs land where the optical design put them.

04

Transparent substrates are standard work

Fused silica, sapphire, and glass are routine substrates for this service, handled, cleaned, and packed to optics expectations.

05

Integrate the related fabrication steps

TGV holes, seal rings, vapor-cell bodies, and cryo metallization live on adjacent pages, one program covers the whole assembly.

06

From 1 piece, honestly

Single parts are quoted and built without a production-order lecture, and repeat lots inherit the exact recipe.

Related service

Fused Silica Wafers: The substrate program behind these windows, grades, tolerances, polishing, and TGV on fused silica.

Fused Silica Wafers →

Start your project.
Initial response typically within one business day.

Share your process requirements, substrate, and production volume. A Nanosystems JP Inc. engineer will give an initial response typically within one business day. Full quote typically within 7-10 business days, subject to project complexity and NDA requirements.

To speed up technical review, please include:
substrate type & size  ·  target process  ·  quantity  ·  timeline  ·  design files if available (not required for first review)

sales@nanosystemsjp.co.jp · +81-3-5288-5569 · NDA available on request

Ready to discuss this process?
Initial engineering response: typically within one business day. NDA available.
Request a Quote →
Services & Industries
Capabilities Overview
Substrates
Substrate & WafersSi, SiC, GaN, glass, sapphire Fused Silica WafersQuartz · borosilicate · low CTE Glass ProcessingDrilling, etching, polishing PI Film & SUS Sensor FabRoll-to-roll · sensor patterning
Front-End
Mask FabricationGDS to chrome mask, DRC PhotolithographyE-beam 20 nm to 500 × 600 mm NanoimprintingUV & thermal NIL Thin Film DepositionPVD, CVD, ALD, MBE ALD CoatingConformal oxides, nitrides PECVD DielectricsSiO₂, SiN, SiON, a-Si TFT & BackplaneIGZO · Glass · Display Lift-OffMetal pattern · shadow mask ElectroplatingCu TSV fill, DPC, LIGA Electroforming & LIGANi shims, meshes, microstructures EtchingICP-RIE, DRIE >50:1 ICP-RIE EtchingSi, oxide, III-V, SiC, quartz MEMS FoundrySensors, actuators, microfluidics Microchannel CoolingEtched, bonded, heater test chips Thermal Test ChipsHeater dies, multi-zone, RTD Temperature SensorsPt/NiCr RTDs, thermocouples AnnealingN₂ / H₂ / vacuum / RTA Ion ImplantationB / P / As / Al / N implant CMP & GrindingCu CMP, 50 µm thinning Wafer ThinningTo 50 µm on carriers Backside MetallizationTi/Ni/Ag, Ti/Ni/Au, Ti/Cu Patterned Test WafersCustom CMP and process evaluation wafers Daisy-Chain Test DiesDummy dies, chains, bump options DicingBlade, stealth laser Stealth & Laser Dicing300 mm Si and glass, SDBG Wafer CleaningRCA, plasma, megasonic Cleaning ChemistryPiranha, SC-1, SC-2, RCA
Advanced Packaging
Wafer BondingHybrid, eutectic, fusion Anodic BondingGlass to silicon, cavities MEMS Cap WafersCavities, ports, seal lands, bonded TSV FabricationHigh AR, Cu fill InterposersSi and glass, TSV/TGV + RDL TSV RevealBackgrind → etch → CMP TGV FabricationThrough-glass via Glass TGV CouponsHole-only to routed prototypes RDL FabricationBCB / PBO / PI + damascene Packaging & AssemblyWire bond, flip-chip Flip-Chip BondingTC, reflow, AuSn, underfill 3D / 2.5D PackagingTSV + RDL + UBM + C4 AuSn BumpPVD lift-off, fluxless Laser SubmountsSi/AlN submounts, optical benches Indium BumpEvap lift-off · cryo/quantum UBM DepositionTi/Pt/Au · adhesion-barrier-Au Cu Pillar & SnAg BumpingPillars with SnAg caps, SnAg bumps Gold BumpEvap & plated · Au-Au TC AuGe / AuSi361/363 °C eutectic die attach High-Pb Bumps95Pb5Sn · hi-rel C4 SLID / TLPCu/Sn · Au/In · Ag/In Al-Ge Sealing424 °C · CMOS-friendly MEMS Ohmic ContactsGaAs · GaN · RTA + TLM SiC ProcessingContacts, implant, 1800 °C anneal GaN & III-VGaN, GaAs, InP processing Cryo / UHV MetalAuSn · Ti/Pd/Au · rings Optical AccessWindows · meshes · holes Vapor CellsDRIE + bond · unfilled TFOI WafersQuartz-on-Si · LNOI Biochip & MicrofluidicsGlass 500 × 600 mm, NIL SiPho PackagingTSV · RDL · UBM · C4 for PIC Photonic DevicesSiN/SOI waveguides, gratings
Industries
AI & HPC PackagingCoWoS-style, 2.5D / 3D Silicon PhotonicsSOI · AuSn · TSV interposer AutomotiveMEMS sensors, SiC power Life SciencesLab-on-chip, biosensors All Industries → Request a Quote →