Glass

Glass Wafer
Processing Services

Holes, cavities, patterns and metal on glass: borosilicate, fused silica, crystalline quartz, ULE and alkali-free glass, as wafers, panels, windows and coupons. Laser and ultrasonic drilling, wet and dry etching, polishing, thin-film patterning and bonding, from one piece.

Fused silica wafers →

Borosilicate, fused silicaQuartz, ULE, alkali-freeLaser drillingWet and dry etchPolishingMetal patterning
20 µm
Via diameter
from
to 2 mm
Glass thickness
range
Wafer / panel
Formats to
500 × 600 mm
1
Piece minimum
order
What we do on glass

Structures, surfaces and films

Laser-drilled viasWet-etched cavityPolished surface

Schematic; hole profile, depth and roughness are confirmed per glass type.

🔬

Through-glass vias and holes

Laser-induced etching and laser or ultrasonic drilling for 20 µm vias to millimetre ports, straight, tapered or conical; arrays to full-wafer count. See TGV.

⚙️

Cavities and channels

HF-based wet etching and dry etching of fused silica and borosilicate for microfluidic channels, optical recesses and cavities. See etching.

🧪

Polishing and thinning

Double-side polishing, thinning and edge finishing for wafers, windows and coupons; roughness and flatness reported.

📐

Metal and ITO patterning

Lift-off and subtractive metal etching, ITO, Au and Ti/Au patterns on one or both faces with front-to-back overlay.

🧩

Bonding

Glass-to-silicon anodic and glass-to-glass fusion or adhesive bonding. See anodic bondingMEMS Cap Wafers.

🔩

Special glass

ULE and other low-expansion glass, thick substrates to 2 mm, laser windows and optical flats handled with dedicated fixtures.

At a glance

Glass Wafer Processing Services

Scope and specification options. Every figure is confirmed for your program in the quotation.

20 µm
Via diameter from
to 2 mm
Glass thickness range
Wafer / panel
Formats to 500 × 600 mm
1
Piece minimum order
Borosilicate, fused silica
Quartz, ULE, alkali-free
Laser drilling
Wet and dry etch
Polishing
Metal patterning
Capability

Typical ranges

Values depend on glass composition and thickness; the quotation states the figures for your part.

FeatureTypicalNote
Glass typesBorosilicate, alkali-free, fused silica, crystalline quartz, ULE, TCO-coated glassCustomer glass reviewed
Thickness100 µm to 2 mmThicker on inquiry
Vias20 µm and up; aspect ratio to ~10:1 filled, ~20:1 openProfile per method
EtchingWet HF for cavities to hundreds of µm; dry etch for fine featuresMask type per depth
PolishingRoughness and flatness per specificationMeasured per lot
PatterningLine and space from 1 µm; double-sided overlay to ~5 µmSee fused silica window work
FormatsPieces, wafers to 300 mm, panels to 500 × 600 mmPer process
What to send

For a glass quotation

ItemWhat helps
GlassType and grade, thickness, format and size, who supplies it
FeaturesDimensioned drawing: holes, cavities, patterns, tolerances
SurfaceRoughness and flatness requirements, which faces matter
DownstreamBonding, metallization or coating that follows
QuantityPieces and target date
Related processes

Processes usually combined with this work

TGV FabricationGlass TGV CouponsFused Silica WafersAnodic BondingEtchingOptical Access
Related service

TGV Fabrication: the process most often combined with this work, run in the same program.

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Direct answers

Questions engineers ask before ordering

Can you coat customer-supplied glass?

Yes. Customer glass is reviewed for composition and condition, then processed as wafers, panels, windows or coupons.

Which glass types?

Borosilicate, alkali-free, fused silica, crystalline quartz, ULE and TCO-coated glass; others on inquiry.

Can you drill a single window?

Yes, from one piece; laser or ultrasonic drilling with straight, tapered or conical profiles.

Start your project.
Initial response within one business day.

Share your process requirements, substrate, and production volume. A Nanosystems JP Inc. engineer gives an initial response, typically within one business day. A written quotation typically follows within 7-10 business days after we receive the required information and complete any prerequisite NDA.

To speed up technical review, please include:
substrate type & size  ·  target process  ·  quantity  ·  timeline  ·  design files if available (not required for first review)

sales@nanosystemsjp.co.jp · +81-3-5288-5569 · NDA available · All inquiries handled confidentially

Ready to discuss this process?
Initial engineering response typically within one business day. NDA available on request.
Request a Quote →
All Services
Full process flow →
Substrates
Substrate & WafersSi, SiC, GaN, glass, sapphire Fused Silica WafersQuartz · borosilicate · low CTE PI Film & SUS Sensor FabRoll-to-roll · sensor patterning
Front-End
Mask FabricationGDS to chrome mask, DRC PhotolithographyE-beam 20nm to 500×600mm NanoimprintingUV & thermal NIL Thin Film DepositionPVD, CVD, ALD, MBE LiftoffMetal pattern · shadow mask ElectroplatingCu TSV fill, DPC, LIGA EtchingICP-RIE, DRIE >50:1 AnnealingN₂/H₂/vacuum/RTA Ion ImplantationB/P/As/Al/N implant CMP & GrindingCu CMP, 50µm thinning DicingBlade, stealth laser Wafer CleaningRCA, plasma, megasonic
Advanced Packaging
Wafer BondingHybrid, eutectic, fusion TSV FabricationHigh AR, void-free Cu fill TSV RevealBackgrind → etch → CMP TGV FabricationThrough-glass via RDL FabricationBCB/PBO/PI + damascene Packaging & AssemblyWire bond, flip-chip 📚 3D/2.5D PackagingTSV+RDL+UBM+C4 AuSn BumpPVD lift-off, fluxless Indium BumpEvap lift-off · cryo/quantum UBM DepositionTi/Pt/Au · adhesion-barrier-Au Gold BumpEvap & plated · Au-Au TC AuGe / AuSi356/363°C eutectic die attach High-Pb Bumps95Pb5Sn · hi-rel C4 SLID / TLPCu/Sn · Au/In · Ag/In Al-Ge Sealing424°C · CMOS-friendly MEMS Ohmic ContactsGaAs · GaN · RTA + TLM Cryo & UHV MetallizationAuSn · Ti/Pd/Au · seal rings Optical AccessWindows · meshes · thru-holes MEMS Vapor CellsDRIE + bond · unfilled bodies Thin-Film-on-InsulatorQuartz-on-Si · LNOI Biochip & MicrofluidicsGlass 500×600mm, NIL SiPho PackagingTSV·RDL·UBM·C4 for PIC
Industries
AI & HPC PackagingCoWoS-style, 2.5D/3D Silicon PhotonicsSOI · AuSn · TSV interposer Quantum TechnologyIon traps · vapor cells · TFOI AutomotiveMEMS sensors, SiC power Life SciencesLab-on-chip, biosensors All Industries → Request a Quote →
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Capabilities Overview
Substrates
Substrate & WafersSi, SiC, GaN, glass, sapphire Fused Silica WafersQuartz · borosilicate · low CTE Glass ProcessingDrilling, etching, polishing PI Film & SUS Sensor FabRoll-to-roll · sensor patterning
Front-End
Mask FabricationGDS to chrome mask, DRC PhotolithographyE-beam 20 nm to 500×600 mm NanoimprintingUV & thermal NIL Thin Film DepositionPVD, CVD, ALD, MBE ALD CoatingConformal oxides, nitrides PECVD DielectricsSiO₂, SiN, SiON, a-Si TFT & BackplaneIGZO · Glass · Display LiftoffMetal pattern · shadow mask ElectroplatingCu TSV fill, DPC, LIGA Electroforming & LIGANi shims, meshes, microstructures EtchingICP-RIE, DRIE >50:1 MEMS FoundrySensors, actuators, microfluidics Microchannel CoolingEtched, bonded, heater test chips Thermal Test ChipsHeater dies, multi-zone, RTD Temperature SensorsPt/NiCr RTDs, thermocouples AnnealingN₂ / H₂ / vacuum / RTA Ion ImplantationB / P / As / Al / N implant CMP & GrindingCu CMP, 50 µm thinning Wafer ThinningTo 50 µm on carriers Patterned Test WafersCustom CMP and process evaluation wafers Daisy-Chain Test DiesDummy dies, chains, bump options DicingBlade, stealth laser Wafer CleaningRCA, plasma, megasonic
Advanced Packaging
Wafer BondingHybrid, eutectic, fusion Anodic BondingGlass to silicon, cavities MEMS Cap WafersCavities, ports, seal lands, bonded TSV FabricationHigh AR, void-free Cu fill InterposersSi and glass, TSV/TGV + RDL TSV RevealBackgrind → etch → CMP TGV FabricationThrough-glass via Glass TGV CouponsHole-only to routed prototypes RDL FabricationBCB / PBO / PI + damascene Packaging & AssemblyWire bond, flip-chip 3D / 2.5D PackagingTSV + RDL + UBM + C4 AuSn BumpPVD lift-off, fluxless Laser SubmountsSi/AlN submounts, optical benches Indium BumpEvap lift-off · cryo/quantum UBM DepositionTi/Pt/Au · adhesion-barrier-Au Cu Pillar & SnAg BumpingPillars with SnAg caps, SnAg bumps Gold BumpEvap & plated · Au-Au TC AuGe / AuSi356/363°C eutectic die attach High-Pb Bumps95Pb5Sn · hi-rel C4 SLID / TLPCu/Sn · Au/In · Ag/In Al-Ge Sealing424°C · CMOS-friendly MEMS Ohmic ContactsGaAs · GaN · RTA + TLM SiC ProcessingContacts, implant, 1800 °C anneal GaN & III-VGaN, GaAs, InP processing Cryo / UHV MetalAuSn · Ti/Pd/Au · rings Optical AccessWindows · meshes · holes Vapor CellsDRIE + bond · unfilled TFOI WafersQuartz-on-Si · LNOI Biochip & MicrofluidicsGlass 500×600 mm, NIL SiPho PackagingTSV · RDL · UBM · C4 for PIC
Industries
AI & HPC PackagingCoWoS-style, 2.5D / 3D Silicon PhotonicsSOI · AuSn · TSV interposer AutomotiveMEMS sensors, SiC power Life SciencesLab-on-chip, biosensors All Industries → Request a Quote →